Preparation of TiO2 thin films by ion beam sputtering method.

DEPOSITION OF THIN TiO2 FILMS BY DC MAGNETRON SPUTTERING METHOD

Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering is a process that can deposit TiO2 material on wafer/glass substrates. In this process target is connected to negative high voltage. Further argon gas is introduced into the chamber and is ionized to a positive charge. The positively charged argon atoms are attracted and strike the nega...

Point defects in Sc2O3 thin films by ion beam sputtering.

We show that the concentration of oxygen interstitials trapped in Sc2O3 films by ion beam sputtering from metal targets can be controlled by modifying deposition conditions. We have identified point defects in the form of oxygen interstitials that are present in Sc2O3 films, in significantly high concentrations, i.e., ∼10(18)  cm(-3). These results show a correlation between the increase of oxy...

Nanocrystalline magnetite thin films grown by dual ion-beam sputtering

Surface Nanostructuring of TiO2 Thin Films by Ion Beam Irradiation

This work reports a procedure to modify the surface nanostructure of TiO2 anatase thin films through ion beam irradiation with energies in the keV range. The irradiation with N ions leads to the formation of a layer with voids at a depth similar to the ion projected range. By setting the ion projected range few tens of nanometres below the surface of the film, well ordered nanorods appear align...

7--s thin films grown in situ by sequential ion beam sputtering

We have analyzed epitaxial, c-axis oriented YBa,CujO, _ 6 thin films grown in situ by sequential ion-beam sputtering on (100) SiTiOs and (100) MgO substrates. X-ray diffraction studies showed the presence of both homogeneous and inhomogeneous lattice distortions along the c-direction. The c-axis lattice parameters ranged from 11.72 to 12.00 A. The broadening of the (001) Bragg peaks in excess o...